Where the owner name is not linked, that owner no longer owns the brand
Technical Examples
Provided is an electron beam system, in which an electron beam emitted from an electron gun is irradiated to a stencil mask, and the electron beam that has passed through the stencil mask is magnified by an electron lens and then detected by a detector having a plurality of pixels so as to form an image of the sample. Further provided is an electron beam system, in which a primary electron beam emitted from an electron gun is directed to a sample surface of a sample prepared as a subject to be inspected, and an electron image formed by a secondary electron beam emanated from the sample is magnified and detected, wherein an NA aperture is disposed in a path common to both of the primary electron beam and the secondary electron beam. An electron lens is disposed in the vicinity of a sample surface, and in this arrangement, a crossover produced by the electron gun, the electron lens and the NA aperture may be in conjugate relationships relative to each other with respect to the primary electron beam.