SYSTEM SPRAY RINSING CHEMICALLY

Brand Owner (click to sort) Address Description
RR Poly Products Corporation 672 N. Middlegate Blvd. Henderson NV 89015 system for spray rinsing chemically treated articles disposed within a single spray rinse tank comprised primarily of an electronic control unit that sequentially operates a plurality of valves and a pump to provide sequential spraying of fresh rinse water, all sold as a unit;
RRR Poly Products Corporation 672 N. Middlegate Blvd. Henderson NV 89015 system for spray rinsing chemically treated articles disposed within a single spray rinse tank comprised primarily of an electronic control unit that sequentially operates a plurality of valves and a pump to provide sequential spraying of fresh rinse water, all sold as a unit;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel. In an embodiment of the present invention, a semiconductor structure is placed into a first treatment vessel and chemically treated. Following the chemical treatment, the semiconductor structure is transferred directly to a second treatment vessel where it is rinsed with DI water and then dried. The second treatment vessel is flooded with both DI water and a gas that is inert to the ambient, such as nitrogen, to form a DI water bath upon which an inert atmosphere is maintained during rinsing. Next, an inert gas carrier laden with IPA vapor is fed into the second treatment vessel. After sufficient time, a layer of IPA has formed upon the surface of the DI water bath to form an IPA-DI water interface. The semiconductor structure is drawn out of the DI water bath at a rate that allows substantially all DI water, and contaminants therein, to be entrained beneath the IPA-DI water interface. In a second embodiment of the present invention, chemical treatment, rinsing, and drying are carried out in a single vessel. In a third embodiment of the present invention, a retrofitted spray/dump rinser with a lid is used for rinsing and drying according to the method of the present invention.