ASM INTERNATIONAL N.V.

ADVANCE 600

WAFER PROCESSOR FOR MANUFACTURING OF SEMI-CONDUCTORS;

ASTRO

Chemical semiconductor wafer processing equipment, namely thermal treatment reactors, chemical vapor deposition reactors, also operating with electric gas discharge; replacement and structural parts for aforesaid goods;Mechanical machines for use in the semiconductor industry, particularly for the manufacture of semiconductors and the deposition of thin films; electronically operated machines for the manufacture of semiconductor wafers and for the deposition of thin films; electronically controlled equipment for the manufacture of semiconductors and for the deposition of thin films; replacement and structural parts for aforesaid goods;

CARBONSPEED

CARBON SPEED;design for others of production processes for the manufacture of semiconductors;

COPPERMINE

treatment for the deposition of thin films on semiconductor wafers; chemical deposition process for the deposition of thin films on semiconductor wafers, namely, process for the chemical vapor deposition of copper films;In the statement, Column 2, line 2, 100213 should be deleted, and 1002113 should be inserted.;COPPER MINE;

DRAGON

SEMICONDUCTOR WATER PROCESSING EQUIPMENT, NAMELY, THERMAL TREATMENT REACTORS; CHEMICAL VAPOR DEPOSITION REACTORS, ALSO OPERATING WITH ELECTRIC GAS-DISCHARGE; ELECTRONICALLY CONTROLLED SEMICONDUCTOR PROCESSING MACHINES FOR THE MANUFACTURE OF SEMICONDUCTORS AND FOR THE DEPOSITION OF THIN FILMS; REPLACEMENT PARTS FOR AFORESAID PRODUCTS;

ECMD

In the statement, Column 1 lines 1 and 2, (NETHERLD ANTILLES CORPORATION) should be deleted, and, (NETHERLANDS (HOLLAND) CORPORATION) should be inserted.;Semiconductor manufacturing machines; semiconductor substrates manufacturing machines; and semiconductor wafer processing machines;In the statement, Column 1, line 4, Netherld Antilles should be deleted, and Netherlands should be inserted.;

ECMP

Semiconductor manufacturing machines; semiconductor substrates manufacturing machines; and semiconductor wafer processing machines;

LUMINA

In the statement, Column 1, lines 1-2, NETHERLD ANTILLES should be deleted, and Netherlands should be inserted, And, In the statement, Column 1, line 4, NETHERLD ANTILLES should be deleted, and Netherlands should be inserted.;Semiconductor manufacturing machines; semiconductor substrates manufacturing machines; and semiconductor wafer processing machines;

LUMINACU

Semiconductor manufacturing machines; semiconductor substrates manufacturing machines; and semiconductor wafer processing machines;

NANOTIER

Chemical semiconductor wafer processing equipment, namely thermal treatment reactors, chemical vapor deposition reactors, also operating with electric gas discharge; electronically controlled chemical equipment for the manufacture of semiconductors and for the deposition of thin films; parts for aforesaid goods.;Mechanical machines for use in the semiconductor industry, particularly for the manufacture of semiconductors and for the deposition of thin films; electronically operated machines for the manufacture of semiconductor wafers and for the deposition of thin films; parts for aforesaid goods.;

POLYGON

[ Semiconductor wafer processing equipment, namely, chemical reactors for depositing thin layers on semiconductor wafers and reactors for the thermal treatment of semiconductor wafers, laboratory robots for use as electronic operating equipment, and parts and fittings therefor ];Mechanical machines for use in the manufacturing of semiconductors and the deposition of thin layers; electronically operated machines used to manufacture semiconductor wafers and the deposition of thin layers; machines used to manufacture semiconductor wafers and the deposition of thin layers, and parts and fittings therefor;Products made of metal, namely, vacuum chambers for use in the manufacturing of semiconductors and the deposition of thin layers [ ; common metals and their alloys for use in the manufacture of semiconductors and the deposition of thin layers ];

PORE BUILDER

Chemical source material in the nature of hydrocarbons, such as hydrocarbons for the deposition of thin films for use in the manufacturing of semiconductors;PORE;

RL-CMP

In the statement, Column 1, lines 1 and 2, Netherld Antilles should be deleted, and Netherlands should be inserted, and, In the statement, Column 1, line 4, Netherld Antilles should be deleted, and Netherlands should be inserted.;Semiconductor manufacturing machines; semiconductor substrates manufacturing machines; and semiconductor wafer processing machines;

SIGEPLUS

Chemical source material for the deposition of thin films in the manufacturing of semiconductors;

SILCORE

Issue New Certificate to: ASM IP Holding B.V. (Netherlands Private Limited Liability Company), Versterkerstraat 8, 1322 AP Almere Netherlands;In the statement, line 1, Holidng should be deleted and Holding should be inserted.;CHEMICALS FOR USE IN THIN FILM DEPOSITION IN THE MANUFACTURE OF SEMICONDUCTORS;

SOFTPOLISH

Semiconductor manufacturing machines; semiconductor substrates manufacturing machines; and semiconductor wafer processing machines.;SOFT POLISH;

SPEEDSIL

chemicals, namely, silicon containing molecules used for the deposition of thin films upon semiconductor wafers for the use in manufacture of semiconductors;

STELLAR

Machines and machine tools, namely, semiconductor wafer processing equipment, including thermal treatment reactors and chemical vapor deposition reactors;

STELLAR

Machines and machine tools, namely semiconductor wafer processing equipment.;