FSI INTERNATIONAL, INC.

ALWAYS THINKING // BETTER

Semiconductor manufacturing machines;

ARIES

tools for cleaning and conditioning the surfaces of electronic devices, namely, semiconductor processing apparatus utilizing cryogenic aerosols for cleaning semiconductors during integrated circuit fabrication;

ATLAS

ELECTRONICALLY CONTROLLED SPRAY APPARATUS FOR PROCESSING SILICON WAFERS REQUIRING SOLVENT STRIPPING, CLEANING, PHOTORESIST DEVELOPING AND RINSING;

HEPASPHERE

electrically ventilated cabinet for industrial use for confining a chemical supply drum;

ICE

tools for cleaning and conditioning the surfaces of electronic devices, namely semiconductor processing equipment for cleaning semiconductors during integrated circuit fabrication;

INSTACURE

Manufacturing machines for processing dielectric layers and layering materials used in the manufacture of microelectronics; semiconductor manufacturing machines; microelectronic device manufacturing equipment, namely, machines for performing a chemical treatment method used in the manufacture of semiconductor and microelectronic devices;INSTANT CURE;

METALLIS

Microelectronics, semiconductor and computer hardware manufacturing machines used for depositing metal, metal curates, films, or coatings in the manufacture of silicon wafers, integrated circuits, semiconductors, semiconductor substrates, computer disc drives and other microelectronic surfaces and devices;

NEPTUNE

ELECTRONICALLY CONTROLLED SPRAY APPARATUS FOR PROCESSING SILICON WAFERS BY RINSING AND DRYING;

ORION

electronically controlled surface conditioning apparatus for dry processing silicon wafers;

PHOENIX

ELECTRONICALLY CONTROLLED SPRAY APPARATUS FOR PROCESSING SILICON WAFERS BY RINSING AND DRYING;

PROTEUS

ELECTRONICALLY CONTROLLED HEATER FOR PROCESS LIQUIDS, NAMELY DEIONIZED WATER;

SATURN

ELECTRONICALLY CONTROLLED SPRAY APPARATUS FOR PROCESSING SILICON WAFERS BY ACID ETCHING, CLEANING AND RINSING;

SYMFLOW

Microelectronic device manufacturing equipment, namely, machines for performing a chemical treatment method used in the manufacture of semiconductor and microelectronic devices;SYSTEM FLOW;

ZEUS

ELECTRONICALLY CONTROLLED SPRAY APPARATUS FOR PROCESSING SILICON WAFERS BY ACID ETCHING;