WE KNOW HOW TO WRITE NANOMETER

Welcome to the Brand page for “WE KNOW HOW TO WRITE NANOMETER”, which is offered here for Production, custom manufacture of structures in dimensions within the range of 5nm and 250nm;[ software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies; ] master substrates for high-resolution and ultra high-resolution replication technologies, semiconductors, quartz and glass for use in patterning at nano scale or near nano scale; reference standards, measurement standard devices for nanometrology, measuring tools having a pattern in the micrometer or nanometer ranges; high-resolution masks and reticles for use in transferring patterns on wafers and other substrates;services in the field of electron beam writing, research, development, [ consultancy ] and customized exposure via focused electrons on solid state substrates, including si, gaas, inp, sic, gan and diamond; services in the field of process technology, research, development [, and consultancy ] of structures in dimensions within the range of 5nm and 250nm [ ; design of, and technical support, troubleshooting of problems, maintenance, and update for software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies ];.

Its status is currently believed to be active. Its class is unavailable. “WE KNOW HOW TO WRITE NANOMETER” is believed to be currently owned by “Xlith GmbH”.

Owner:
XLITH GMBH
Owner Details
Description:
Production, custom manufacture of structures in dimensions within the range of 5nm and 250nm;[ Software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies; ] master substrates for high-resolution and ultra high-resolution replication technologies, semiconductors, quartz and glass for use in patterning at nano scale or near nano scale; reference standards, measurement standard devices for nanometrology, measuring tools having a pattern in the micrometer or nanometer ranges; high-resolution masks and reticles for use in transferring patterns on wafers and other substrates;Services in the field of electron beam writing, research, development, [ consultancy ] and customized exposure via focused electrons on solid state substrates, including Si, GaAs, InP, SiC, GaN and diamond; services in the field of process technology, research, development [, and consultancy ] of structures in dimensions within the range of 5nm and 250nm [ ; design of, and technical support, troubleshooting of problems, maintenance, and update for software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies ];
Categories: PRODUCTION