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Welcome to the Brand page for “C P-LOK”, which is offered here for Chemicals for use in the manufacture of low dielectric insulating film for use in semiconductors and integrated circuits; chemicals in the nature of porogens, decomposing chemicals for forming pores in low dielectric insulating film; post chemical mechanical planarization (cmp) cleaning chemical preparations for removing slurries and polishing debris;.
Its status is currently believed to be active. Its class is unavailable. “C P-LOK” is believed to be currently owned by “VERSUM MATERIALS US, LLC”.
| Owner: |
VERSUM MATERIALS US, LLC
Owner Details |
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| Description: |
Chemicals for use in the manufacture of low dielectric insulating film for use in semiconductors and integrated circuits; chemicals in the nature of porogens, decomposing chemicals for forming pores in low dielectric insulating film; post chemical mechanical planarization (CMP) cleaning chemical preparations for removing slurries and polishing debris;
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| Categories: | CHEMICALS USE |