AK FORTY SEVEN

Brand Owner (click to sort) Address Description
AK-47 BOMB SAUCE IP Suite 100 4000 Northfield Way Roswell GA 30076 AK FORTY SEVEN;Electronic cigarette liquid (e-liquid) comprised of propylene glycol; Electronic cigarette liquid (e-liquid) comprised of vegetable glycerin; Liquid nicotine solutions for use in electronic cigarettes;
AK-47 Combat Flip Flops 50 SE Bush St. Issaquah WA 98027 AK-FORTY SEVEN;Flip flops; Footwear;
AK-47 KALASHNIKOV USA 108 West 13th St Wilmington DE 19801 AK FORTY SEVEN;Firearm attachments, namely, modular external rail systems for firearms; Firearm attachments, namely, modular external rail systems for attaching accessories to firearms; Firearm attachments, namely, mounts for attaching accessories to a firearm; Firearm attachments, namely, mounts for attaching ancillary equipment to a firearm; Firearm attachments, namely, mounts for attaching grips to a firearm; Firearm attachments, namely, mounts for attaching gun sights to a firearm; Firearm attachments, namely, mounts for attaching laser pointing devices to a firearm; Firearm attachments, namely, mounts for attaching lights to a firearm; Firearm attachments, namely, mounts for attaching night vision devices to a firearm; Firearm attachments, namely, mounts for attaching telescopic sights to a firearm; Firearm hand guards; Firearm magazine speedloaders; Firearm tactical rails; Firearms; Ammunition for firearms; Automatic firearm ammunition belts; Bipods for firearms; Covers for firearms; Foresights for firearms; Hunting firearms; Monopods for firearms; Non-telescopic gun sights for firearms; Sights, namely, open sights for use on firearms; Sights, other than telescopic sights, for firearms; Silencers for firearms; Sporting firearms; Stands for firearms; Supplemental chambers for firearms; Triggers for firearms; Tripods and stands for firearms; Weapon cases for firearms;
AK-47 Malic C. Bedford 5648 Toyon Road San Diego CA 92115 AK-FORTY SEVEN;Distilled spirits;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A system and method is disclosed for selectively increasing a wet etch rate of a large raised area portion of a semiconductor wafer with respect to a wet etch rate of a small raised area portion of the semiconductor wafer. A resist mask on the semiconductor wafer is etched to create a large via over the large raised area portion and a small via over the small raised area portion. An ion implantation beam is applied with an impact direction that enables ions to pass through the large via but does not enable ions to pass through the small via. The ions that pass through the large via increase the wet etch rate of the underlying portion of the semiconductor wafer. In one embodiment the impact direction has a tilt angle of forty five degrees and a rotation angle of forty five degrees.