ANGLED ORIENTATION

Brand Owner Address Description
JUMP CREATIVE JUMP SYSTEMS, INC. 5560 Courage Drive New Albany OH 43054 The angled orientation of the drawing is a feature of the mark.The mark may be described as the word JUMP, shown in an irregular cursive script suggestive of preparation with a brush of the kind typical of brushes used to produce calligraphic representations of the pictographic characters which distinguish written Asian languages, which calligraphy constitutes a well-recognized Asian art-form, the said word accompanied by extraneous non-letter additional marks over, under and at the end of the said word which appear as a random-brush-marks or brush-created ink spatters, the said word, together with such random, extraneous marks, being superimposed across the short axis of a shaded oval which is itself superimposed over the left lower quadrant of a more darkly shaded square that fully contains the said word and extraneous marks but does not fully contain the said oval, all of which is shown as a unit, angled upward at the right approximately 30 degrees from the horizontal.;Licensing of Asian Foods Restaurant;Restaurant Services and Carry-out;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of the mask pattern are formed by exposure to an electron beam. The orientation of the substrate and a path of the generally rectangular-shaped shot from the electron beam may be relatively altered such that the substrate is exposed to the electron beam to form the angled features as if they were non-angled features. In another exemplary embodiment, the electron beam lithography system determines whether it is necessary to relatively alter the orientation of the substrate and a path of the generally rectangular-shaped shot from the electron beam to form the angled features based on the number of angled features and the time required for relatively altering the orientation. Electron beam lithography systems employing a rotatable stage, rotatable apertures, or both, are also disclosed.