APPARATUS THIN FILM DEPOSITION

Brand	Owner	Address	Description
OPAL	OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLSLIMITED	Tubney Woods Abingdon, Oxon OX13 5QX United Kingdom	Apparatus for thin film deposition, including atomic layer deposition, namely, a reaction chamber, an energy source, means for introducing precursor and substrate chemical preparations into the reaction chamber, and sensors for measuring and monitoring deposition growth;Machines for manufacturing semiconductors;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

In a display device including thin film transistors formed on an insulation substrate, the thin film transistor includes a semiconductor layer, a gate electrode and a gate insulation film which is interposed between the semiconductor layer and the gate electrode. The gate insulation film includes at least one layer of deposition film which is deposited by a deposition method, and the carbon concentration of the gate insulation film which is formed without interposing other deposition film deposited by a deposition method between the one deposition film and the semiconductor layer has the distribution in which the carbon concentration is smaller at a side close to the semiconductor layer than at a side remote from the semiconductor layer. Due to such a constitution, it is possible to obviate the elevation of a level of an interface of the insulation film with respect to a poly silicon layer and it is also possible to obviate an increase of fixed charges in the inside of the insulation film in the thin film transistor.