ATOMIC LAYER DEPOSITION ALD MACHINES

Brand Owner (click to sort) Address Description
BAM Jusung Engineering Co., Ltd. 240, Opo-ro, Opo-eup, Gwangju-si Gyeonggi-do 12773 Republic of Korea Atomic layer deposition (ALD) machines used for manufacturing light emitting diodes (LEDs); etching machines used for manufacturing light emitting diodes (LEDs); deposition machines used for manufacturing light emitting diodes (LEDs); deposition machines used for manufacturing organic light emitting diodes (OLEDs); etching machines used for manufacturing organic light emitting diodes (OLEDs); atomic layer deposition (ALD) machines used for manufacturing organic light emitting diodes (OLEDs); metal organic chemical vapor deposition machines; deposition machines used for manufacturing semiconductors; etching machines used for manufacturing semiconductors; atomic layer deposition (ALD) machines used for manufacturing semiconductors; semiconductor processing machines; low pressure chemical vapor deposition machines; etching machines used for manufacturing solar cells; atomic layer deposition (ALD) machines used for manufacturing solar cells; deposition machines used for manufacturing solar cells; atomic layer deposition (ALD) machines used for manufacturing flat panel displays; etching machines used for manufacturing flat panel displays; deposition machines used for manufacturing flat panel displays; plasma enhanced chemical vapor deposition machines; plasma chemical vapor deposition machines; OLED manufacturing apparatus, namely, machines for manufacturing organic light emitting diodes (OLEDs; gas distributing plates being structural component parts of apparatuses for manufacturing semiconductors, namely, semiconductor substrate manufacturing machines; substrates processing apparatus in the nature of semiconductor substrates manufacturing machines; apparatus in the nature of machines for manufacturing flat panel displays; apparatus in the nature of machines for manufacturing semiconductors; semiconductor wafer processing equipment; apparatus in the nature of machines for manufacturing solar battery; plasma surface treating machines; vacuum chambers being structural component parts of machines for processing semiconductor substances;
BLAM Jusung Engineering Co., Ltd. 240, Opo-ro, Opo-eup, Gwangju-si Gyeonggi-do 12773 Republic of Korea Atomic layer deposition (ALD) machines used for manufacturing light emitting diodes (LEDs); etching machines used for manufacturing light emitting diodes (LEDs); deposition machines used for manufacturing light emitting diodes (LEDs); deposition machines used for manufacturing organic light emitting diodes (OLEDs); etching machines used for manufacturing organic light emitting diodes (OLEDs); atomic layer deposition (ALD) machines used for manufacturing organic light emitting diodes (OLEDs); metal organic chemical vapor deposition machines; deposition machines used for manufacturing semiconductors; etching machines used for manufacturing semiconductors; atomic layer deposition (ALD) machines used for manufacturing semiconductors; semiconductor processing machines; low pressure chemical vapor deposition machines; etching machines used for manufacturing solar cells; atomic layer deposition (ALD) machines used for manufacturing solar cells; deposition machines used for manufacturing solar cells; atomic layer deposition (ALD) machines used for manufacturing flat panel displays; etching machines used for manufacturing flat panel displays; deposition machines used for manufacturing flat panel displays; plasma enhanced chemical vapor deposition machines; plasma chemical vapor deposition machines; OLED manufacturing apparatus, namely, machines for manufacturing organic light emitting diodes (OLEDs); gas distributing plates being structural component parts of apparatuses for manufacturing semiconductors, namely, semiconductor substrate manufacturing machines; substrates processing apparatus in the nature of semiconductor substrates manufacturing machines; apparatus in the nature of machines for manufacturing flat panel displays; apparatus in the nature of machines for manufacturing semiconductors; semiconductor wafer processing equipment; apparatus in the nature of machines for manufacturing solar battery; plasma surface treating machines; vacuum chambers being structural component parts of machines for processing semiconductor substances;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. An atomic layer deposition method for forming a microelectronic layer employs a reactor chamber pressure of greater than about 500 mtorr and more preferably from about 20 to about 50 torr. By employing a reactor chamber pressure within the foregoing range, the microelectronic layer is formed with an enhanced deposition rate while employing the atomic layer deposition method, due to a gas phase chemical vapor deposition component to the atomic layer deposition method.