BIOGENETIC MATERIALS USE

Brand Owner (click to sort) Address Description
CLASPER SYSTEM GENAISSANCE PHARMACEUTICALS, INC. Five Science Park New Haven CT 06514 Biogenetic materials for use in the field of genomic pharmacology;SYSTEM;Research, consulting and technology licensing services in the field of genomic pharmacology;
CODE SIG GENAISSANCE PHARMACEUTICALS, INC. Five Science Park New Haven CT 06514 biogenetic materials for use in the field of genomic pharmacology;research, consulting and technology licensing services in the field of genomic pharmacology;
DECOGEN GENAISSANCE PHARMACEUTICALS, INC. Five Science Park New Haven CT 06514 biogenetic materials for use in the field of genomic pharmacology;research, consulting and technology licensing services in the field of genomic pharmacology;
GENTHOLOGY GENAISSANCE PHARMACEUTICALS, INC. Five Science Park New Haven CT 06514 biogenetic materials for use in the field of genomic pharmacology;research, consulting and technology licensing services in the field of genomic pharmacology;
MODUHYB GENAISSANCE PHARMACEUTICALS, INC. Five Science Park New Haven CT 06514 Biogenetic materials for use in the field of genomic pharmacology;Research, consulting and technology licensing services in the field of genomic pharmacology;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Method and structure for optimizing dual damascene patterning with polymeric dielectric materials are disclosed. Certain embodiments of the invention comprise polymeric sacrificial light absorbing materials ("polymer SLAM") functionalized to have a controllable solubility switch wherein such polymeric materials have substantially the same etch rate as conventionally utilized polymeric dielectric materials, and subsequent to chemical modification of solubility-modifying protecting groups comprising the SLAM materials by thermal treatment or in-situ generation of an acid, such SLAM materials become soluble in weak bases, such as those conventionally utilized to remove materials in lithography treatments.