BLOCKING DUMMIES

Brand Owner (click to sort) Address Description
A.PAD ROGERS ATHLETIC COMPANY, INCORPORATED Farwell MI BLOCKING DUMMIES, SHIELDS AND SLED PADS USED IN TEACHING BLOCKING TECHNIQUES IN THE GAME OF FOOTBALL;A PAD;
D.PAD ROGERS ATHLETIC COMPANY INCORPORATED 3766 W. LUDINGTON DRIVE FARWELL MI 48622 BLOCKING DUMMIES, SHIELDS AND SLED PADS USED IN TEACHING BLOCKING TECHNIQUES IN THE GAME OF FOOTBALL;D PAD;
HAHAGAME Sheng, Feifei No.40,Shengbu Village Lingang Town Leping Jiangxi 333300 China Blocking dummies; Body-building apparatus; Fishing tackle; Kits for building outdoor play equipment; Manually-operated exercise equipment; Parlor games; Play swimming pools; Shin pads for athletic use; Sports field training grids; Swimming aids, namely, pool rings and arm floats for recreational use; Volley balls;HA HA GAME;
KRAUSKO TACTICAL Krausko Robotics 3610 Corona Drive Racine WI 53406 Blocking dummies, namely, tackling dummies, tackling dummies with appendages, tackling dummies with spring loaded appendages, remote controlled tackling dummies, tackling dummies mounted to a remote controlled movable base; tackling dummies configured for receiving fire arm target practice, tackling dummies configured for receiving nonlethal fire arm target practice; heavy bags in the nature of punching bags, striking target pads in the nature of martial arts target pads;Color is not claimed as a feature of the mark.;TACTICAL;
MOCPIXEL US METOO 1700 SAN PABLO RD. S. SUITE 404 JACKSONVILLE FL 32224 Blocking dummies; Children's educational toys for developing fine motor, cognitive and counting skills skills; Children's multiple activity toys; Electronic toy building blocks that light up as a night light; Electronic toy vehicles; Impact markers in the nature of pressure sensitive reusable impact labels for attachment to the head of a golf club to indicate where the club hits the ball; Molded toy figures; Non-electronic toy vehicles; Remote control toys, namely, cars, race cars, airplanes and boats; Toy aircraft; Toy animals; Toy building blocks; Toy building blocks capable of interconnection; Toy construction blocks; Toy drones; Toy figures; Toy furniture; Toy guns; Toy robots; Water toys;The wording MOCPIXEL has no meaning in a foreign language.;
PRO SCREEN Ronald S. Johnson 3491-196A Street Langley, B.C. V3A1A4 Canada Blocking dummies;
ROGERS T 02 BAG O. DAVID ROGERS 3942 W. LUDINGTON DRIVE FARWELL MI 48622 BLOCKING DUMMIES, SHIELDS AND SLED PADS USED IN TEACHING BLOCKING TECHNIQUES IN THE GAME OF FOOTBALL;
SODITER shenzhenshisenzhukejiyouxiangongsi Gangzhilong Science and Technology Park, Room 205, 207, Block C, Business Center, Longhua?shenzhen 518000 China Blocking dummies; Toy building blocks; Toy building blocks capable of interconnection; Toy building structures and toy vehicle tracks; Toy buildings and accessories therefor; Toy cars; Toy models; Toy stamps; Toy tiaras; Toy tools; Electronic toy building blocks that light up as a night light; Magnetic building blocks being toys; Starting blocks for swimming; Swimming equipment, namely, starting blocks; Yoga blocks;
TAG.ALONG ROGERS ATHLETIC COMPANY, INCORPOATED 3766 W. LUDINGTON DRIVE FARWELL MI 48622 BLOCKING DUMMIES, SHIELDS AND SLED PADS USED IN TEACHING BLOCKING TECHNIQUES IN THE GAME OF FOOTBALL;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A photolithography and etch process sequence includes a photomask having a pattern with compensation features that alleviate patterning variations due to the proximity effect and depth of focus concerns during photolithography. The compensation features may be disposed near isolated or outermost lines of a device pattern. A photoresist pattern is formed to include the compensation features and the pattern etched to form a corresponding etched pattern including the compensation features. After etching, a protection material is formed over the layer and a trim mask is used to form a further photoresist pattern over the protection material. A subsequent etching pattern etches the protection material and removes the compensation features and results in the device lines being formed unaffected by proximity effects. Flare dummies may additionally be added to the mask pattern to increase pattern density and assist in endpoint detection. Flare dummies, like the compensation features, are subsequently removed by a photolithography and etching process sequence.