CHEMICAL COMPOSITIONS FOR REMOVAL

Brand Owner (click to sort) Address Description
CATABAN RHODIA, INC. New York NY CHEMICAL COMPOSITIONS FOR THE REMOVAL OF HYDROGEN SULFIDE AND MERCAPTANS FROM LIQUID AND GASEOUS STREAMS;
RESIN RINSE NALCO CHEMICAL COMPANY Chicago IL CHEMICAL COMPOSITIONS FOR THE REMOVAL OF ORGANIC FOULANTS FROM INDUSTRIAL ION EXCHANGE SYSTEMS;
RESIN RINSE ECOLAB USA INC. 1 Ecolab Place Saint Paul MN 55102 CHEMICAL COMPOSITIONS FOR THE REMOVAL OF ORGANIC FOULANTS FROM INDUSTRIAL ION EXCHANGE SYSTEMS;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. The present invention provides a method for fabricating low-resistance, sub-0.1 ?m channel T-gate MOSFETs that do not exhibit any poly depletion problems. The inventive method employs a damascene-gate processing step and a chemical oxide removal etch to fabricate such MOSFETs. The chemical oxide removal may be performed in a vapor containing HF and NH3 or a plasma containing HF and NH3.