CHROMIUM ELECTROPLATING BATHS CHEMICAL

Brand Owner (click to sort) Address Description
CHROMONYX KEWANEE OIL COMPANY 1945 E. 97TH ST. CLEVELAND OH 44106 CHROMIUM ELECTROPLATING BATHS AND CHEMICAL ADDITION AGENTS FOR USE IN CHROMIUM ELECTROPLATING BATHS;
DC-700 ATOTECH DEUTSCHLAND GMBH Erasmusstrasse 20 Berlin 10553 Germany CHROMIUM ELECTROPLATING BATHS AND CHEMICAL ADDITION AGENTS FOR USE IN CHROMIUM ELECTROPLATING BATHS;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A process which uses a silicone resin to form a wafer-to-carrier bonded package that enables wafer thinning and backside processing while the cured resin exhibits high chemical and thermal resistance. The process is versatile in that the constructed wafer package allows for a wide range of chemical exposures to include dilute acid and base etchants, resist and residue strippers, electroplating chemistries, and also providing use in a range of deposition and etch processes that may exceed 300° C. The process utilizes a mixture of silicone monomers that when applied to semiconductor wafers by a spin-coat application, the result is a planarization of the front side device area, and when a subsequent thin coat is applied will facilitate bonding of the wafer-to-carrier package when heat and pressure are applied. The cured silicone bonded wafer-to-carrier package allows for wafer thinning consistent to industry objectives. Backside processing may include thermal oxide deposition, installed vias, and subsequent metallization in plating baths. Upon completion of a thinned and processed wafer, detachment occurs as described in prior art. Specialty chemical systems which completely dissolves the cured silicone and allows the wafer substrate to be easily rinsed and dried and become available for subsequent processing or final dicing and packaging.