CLEAN CHANGE

Brand Owner (click to sort) Address Description
KLEEN-CHANGE PALL CORPORATION 25 Harbor Park Drive Port Washington NY 11050 clean change;filter elements and assemblies therefor for use in filtering toxic, corrosive, hazardous or volatile fluids;
KLEEN-CHANGE PALL CORPORATION 25 Harbor Park Drive Port Washington NY 11050 CLEAN CHANGE;filters and assemblies therefore, for use in filtering toxic, corrosive, hazardous or volatile fluids, used in the microchip and computer industries;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method for removing polymer as an etching residue is described. A substrate with polymer as an etching residue thereon is provided, and a hydrogen-containing plasma is used to treat the substrate. A wet clean step is then performed to remove the polymer from the substrate. The treatment using hydrogen-containing plasma can change the chemical property of the polymer, so that the polymer can be removed more easily in the subsequent wet clean step.