CLEANING SOLVENTS WITH LOW NON VOLATILE RESIDUE

Brand	Owner	Address	Description
Q CLEAN	THERMO ANALYTICAL INC.	2030 Wright Avenue Richmond CA 94804	cleaning solvents with low non-volatile-residue content for use in micro-contamination control in the aeronautics, semi-conductor, and micro-chip industries;cleaning cloths;CLEAN;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

A post-etch residue cleaning composition for cleaning ashed or unashed aluminum/SiN/Si post-etch residue from small dimensions on semiconductor substrates. The cleaning composition contains supercritical CO2 (SCCO2), alcohol, fluoride source, an aluminum ion complexing agent and, optionally, corrosion inhibitor. Such cleaning composition overcomes the intrinsic deficiency of SCCO2 as a cleaning reagent, viz., the non-polar character of SCCO2 and its associated inability to solubilize species such as inorganic salts and polar organic compounds that are present in the post-etch residue and that must be removed from the semiconductor substrate for efficient cleaning. The cleaning composition enables damage-free, residue-free cleaning of substrates having ashed or unashed aluminum/SiN/Si post-etch residue thereon.