COMBINED CLEANING POLISHING PREPARATION

Brand Owner (click to sort) Address Description
ECHO Procter & Gamble Company, The One Procter & Gamble Plaza Cincinnati OH 45202 COMBINED CLEANING AND POLISHING PREPARATION FOR USE ON FLOORS;
GLASS GLOSS FAULTLESS STARCH/BON AMI COMPANY 1009 WEST 8TH STREET KANSAS CITY MO 641011200 COMBINED CLEANING AND POLISHING PREPARATION;
MING MING OF AMERICA, INC. BELTON MO. COMBINED CLEANING AND POLISHING PREPARATION FOR AUTOMOBILE FINISHES;THE VERTICAL LINING ON THE DRAWING DESIGNATES THE COLOR RED;
MING HANG FAI HOLDING LIMITED 200 CONNAUGHT ROOD CENTRAL SUITE 1012 WEST TOWER, SHUN TAK CENTRE HONG KONG Hong Kong COMBINED CLEANING AND POLISHING PREPARATION FOR AUTOMOBILE FINISHES;
MING STEBENNE LABORATORIES, INC. 2042 S. BROADWAY DENVER CO COMBINED CLEANING AND POLISHING PREPARATION FOR AUTOMOBILE FINISHES;THE VERTICAL LINING ON THE DRAWING DESIGNATES THE COLOR RED;
REE-NU-LITE CARSELLO CHEMICAL PRODUCTS COMBINED CLEANING AND POLISHING PREPARATION FOR FLOORS;RENEW-LIGHT;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A polishing pad is cleaned of Cu CMP by-products, subsequent to planarizing a wafer, to reduce pad-glazing by applying to the polishing pad surface a composition comprising about 0.1 to about 3.0 wt. % of at least one organic compound having one or more amine or amide groups, an acid or a base in an amount sufficient to adjust the pH of the composition to about 5.0 to about 12.0, the remainder water. Embodiments comprise ex situ cleaning of a rotating polishing pad by applying a solution having a pH of about 5.0 to about 12.0 at a flow rate of about 100 to about 600 ml/min. for about 3 to about 20 seconds after polishing a wafer having a Cu-containing surface and then removing the cleaning solution from the polishing pad by high pressure rinsing with water.