CONCENTRATED SOLUTION USED CLEAN

Brand	Owner	Address	Description
SOAK-N-DISSOLVE	LAN-O-SHEEN, INC.	804 FINCH BLDG. ST. PAUL MN	CONCENTRATED SOLUTION USED TO CLEAN HAIR BRUSHES AND COMBS AND THE LIKE;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

A method for texturing surfaces of silicon wafers comprising the steps of dipping the silicon wafers in an etching solution of water, concentrated hydrofluoric acid and concentrated nitric acid and setting a temperature for the etching solution. The etching solution comprises, in percent, 20% to 55% water, 10% to 40% concentrated hydrofluoric acid and 20% to 60% concentrated nitric acid and the temperature of the etching solution is between 0 and 15 degrees Celsius.