CYBER DUMMIES

Brand Owner (click to sort) Address Description
CYBER-DUMMIES SLOVENKO, GLENN D. 4 Executive Plaza Suite:140 Yonkers NY 10701 CYBER DUMMIES;computer services, namely, providing an on-line magazine featuring feature articles, promotional and E-commerce materials, interactive capabilities, and extensive information resources in the fields of personal growth and business;
CYBER-DUMMIES SLOVENKO, GLENN D. 4 Executive Plaza Suite:140 Yonkers NY 10701 CYBER DUMMIES;portable beverage coolers, beverage glassware, bottle openers, coffee cups, containers for food and beverages, coolers for storing food and beverages, cups, drinking glasses, flasks, mugs, and food and beverage vessels;
CYBERDUMMIES SLOVENKO, GLENN D. 4 Executive Plaza Suite:140 Yonkers NY 10701 CYBER DUMMIES;Providing ergonomic and non-ergonomic computer internet and informational technology interfacing and branding services, namely arranging and conducting trade shows cartoon character licensing, assembling and distributing shoppers' guide information, managing computerized databases, conducting market research for individual and commercial use, promoting the events of others and offering technical assistance;
CYBERDUMMIES GLENN D. SLOVENKO 445-2 Warburton Ave. Hastings-on-Hudson NY 107062836 CYBER DUMMIES;Providing ergonomic and non-ergonomic computer Internet and informational technology interfacing and branding services, namely computer consultation computer diagnostics, computer leasing computer rental computer services, computer interface design, and computer software industrial design of software and structural elements retail stores for computers and personal technology and software rental;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A photolithography and etch process sequence includes a photomask having a pattern with compensation features that alleviate patterning variations due to the proximity effect and depth of focus concerns during photolithography. The compensation features may be disposed near isolated or outermost lines of a device pattern. A photoresist pattern is formed to include the compensation features and the pattern etched to form a corresponding etched pattern including the compensation features. After etching, a protection material is formed over the layer and a trim mask is used to form a further photoresist pattern over the protection material. A subsequent etching pattern etches the protection material and removes the compensation features and results in the device lines being formed unaffected by proximity effects. Flare dummies may additionally be added to the mask pattern to increase pattern density and assist in endpoint detection. Flare dummies, like the compensation features, are subsequently removed by a photolithography and etching process sequence.