Dandruff Remover, Nail-Polish Remover, Nail Dryer;
Where the owner name is not linked, that owner no longer owns the brand
Technical Examples
A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable for removing a variety of resists from substrates at different stages in the process of manufacturing integrated circuits.