DARE RESIST DRUGS

Brand Owner Address Description
D.A.R.E. TO RESIST DRUGS AND VIOLENCE D.A.R.E. AMERICA Unit 500 400 Corporate Pointe Culver City CA 90230 DARE TO RESIST DRUGS AND VIOLENCE;Graduated rulers, magnets, calculators, sunglasses;Pocket knives;Bags, namely fanny packs, duffel bags, tote bags, backpacks, all-purpose sport and athletic bags, barrel bags, nylon school bags and garment bags for travel, wallets, briefcases, briefcase-type portfolios, umbrellas;Metal key rings, metal key fobs, metal license plates, metal locks;Balloons, yo yos, golf balls, golf tees, miniature t-shirts for toy action figures;Pencils, stickers, book covers, bookmarks, pens, erasers, binders, stationery folders, paper certificates, memo pads, desk name cards, notepads, paper clip holders, decals, pencil cases, paper pennants, stationery type portfolios, baseball cards, identification cards, nylon lunch bags;Patches for clothing, ornamental novely buttons, zipper pulls, fabric covered elasticized hair bands;Clocks, ornamental pins, watches, medallions;Clothing, namely T-shirts, jackets, sweatshirts, polo shirts, shorts, caps, ties, ponchos, wrist bands;Cloth flags, cloth banners;non-metal License plate frames;Mugs, squeeze bottles sold empty, jugs, thermal bottles sold empty;plastic novelty license plates; non-metal license plates;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. The invention relates to a resist for electron beam lithography and to a process for producing photomasks for optical lithography. The inventive resist includes repeating units that are derived from maleic anhydride and that can act as an anchor group for the subsequent binding of silicon-containing groups. The etch stability of the resist can thus be subsequently increased so that there is no dimensional loss on transfer of the resist structure to a chromium layer arranged under the resist.