DETERGENTS CLEANING COMPOUNDS FOR

Brand	Owner	Address	Description
GENESIS GEL	PARK CORPORATION, THE	511 LAKE ZURICH ROAD BARRINGTON IL 60010	DETERGENTS AND CLEANING COMPOUNDS FOR INSTITUTIONAL AND FOODSERVICE USE, NAMELY POT AND PAN DETERGENTS, LAUNDRY DETERGENTS, PRESOAKS, GENERAL PURPOSE CLEANERS, AND RINSE ADDITIVES;GEL;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

A post-etch residue cleaning composition for cleaning ashed or unashed aluminum/SiN/Si post-etch residue from small dimensions on semiconductor substrates. The cleaning composition contains supercritical CO2 (SCCO2), alcohol, fluoride source, an aluminum ion complexing agent and, optionally, corrosion inhibitor. Such cleaning composition overcomes the intrinsic deficiency of SCCO2 as a cleaning reagent, viz., the non-polar character of SCCO2 and its associated inability to solubilize species such as inorganic salts and polar organic compounds that are present in the post-etch residue and that must be removed from the semiconductor substrate for efficient cleaning. The cleaning composition enables damage-free, residue-free cleaning of substrates having ashed or unashed aluminum/SiN/Si post-etch residue thereon.