DETERGENTS FOR CLEANING PARTICLE ANALYSIS

Brand	Owner	Address	Description
CC	COULTER CORPORATION	600 WEST 20TH STREET HIALEAH FL 33010	DETERGENTS FOR CLEANING PARTICLE ANALYSIS EQUIPMENT;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

Suppressor and anti-suppressor additives in an acid copper sulfate plating bath are analyzed by the cyclic voltammetric stripping (CVS) method without cleaning or rinsing the cell between the two analyses. The suppressor analysis is performed first and the suppressor concentration in the resulting measurement solution is adjusted to a predetermined value corresponding to full suppression. This fully-suppressed solution is then used as the background electrolyte for the anti-suppressor analysis. This integrated analysis approach provides results comparable to those obtained with cell cleaning and rinsing between the analyses but significantly reduces the analysis time, consumption of expensive chemicals, and quantity of hazardous waste generated.