DIGITAL EXPOSING MACHINES EXPOSING

Brand Owner (click to sort) Address Description
CTCP XEIKON IP BV Brieversstraat 70 Eede NL4529 GZ Netherlands Digital exposing machines for exposing printing plates;Statement(s): Column 1, before line 1, PUNCH GRAPHIX PREPRESS GERMANY GMBH Should is inserted.;[ Printing plates; plates for offset printing ];[ Maintenance and repair of printing machines ];[ Chemicals for developing and exposing of plates for offset printing ];
CTCP BasysPrint GmbH Systeme fuer die Druckindustrie Guelzer Strasse 15 19258 Boizenburg Germany Digital exposing machines for exposing printing plates;Statement(s): Column 1, before line 1, PUNCH GRAPHIX PREPRESS GERMANY GMBH Should is inserted.;[ Printing plates; plates for offset printing ];[ Maintenance and repair of printing machines ];[ Chemicals for developing and exposing of plates for offset printing ];
CYREL DUPONT ELECTRONICS, INC. 974 CENTRE ROAD WILMINGTON DE 19805 digital exposing machines for exposing photopolymer printing plates; exposed photographic film; computer printers; and computer software used for print analysis;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method of fabricating a semiconductor device includes an exposing process in which a lower pattern is formed by a first exposing process and an upper pattern is formed thereon by a second exposing process, wherein the exposure process includes the steps of obtaining a first correction value representing a difference of first and second alignment error correction parameter preset values respectively used at the time of a first exposing process of exposing the lower patterns in a current lot and in a just-before lot, obtaining, as a second correction value, an optimum correction amount of a third alignment error correction parameter preset value needed for proper alignment of the upper pattern in the second exposing process of the just-before lot, the third alignment error correction parameter has been used in the second exposing process of the just-before lot for exposing the upper pattern, and obtaining an optimum correction parameter prediction value to be used for exposing the upper pattern in the second exposing process of the current lot, from the first correction value and the second correction value.