FABRICATED INSULATING BARRIERS MATERIALS

Brand Owner (click to sort) Address Description
ALUMISEAL C. T. HOGAN & COMPANY, INC. 383 MADISON AVENUE NEW YORK NY FABRICATED INSULATING BARRIERS AND MATERIALS FOR SUCH BARRIERS, INCLUDING SHEET ALUMINUM INSULATION AND VAPOR BARRIERS, COMPRISING SELF-SUSTAINING, NON-POROUS, HEAT-REFLECTIVE SHEETS OF ALUMINUM USEED FOR INSULATING BARRIERS FOR REFRIGERATED STRUCTURES, INSULATING BARRIERS FOR STRUCTURES EXPOSED TO HIGH TEMPERATURES, AND INSULATING BARRIERS FOR EQUIPMENT AND PIPES OPERATED AT REFRIGERATING OR HIGH TEMPERATURES;
ALUMISEAL ALUMISEAL CORPORATION 383 MADISON AVENUE NEW YORK NY fabricated insulating barriers and materials for such barriers, including sheet aluminum insulation and vapor barriers, comprising self-sustaining, non-porous, heat-reflective sheets of aluminum used for insulating barriers for refrigerated structures, insulating barriers for structures exposed to high temperatures, and insulating barriers for equipment and pipes operated at refrigerating or high temperatures;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method of forming a rhodium-containing layer on a substrate, such as a semiconductor wafer, using complexes of the formula LyRhYz is provided. Also provided is a chemical vapor co-deposited platinum-rhodium alloy barriers and electrodes for cell dielectrics for integrated circuits, particularly for DRAM cell capacitors. The alloy barriers protect surrounding materials from oxidation during oxidative recrystallization steps and protect cell dielectrics from loss of oxygen during high temperature processing steps. Also provided are methods for CVD co-deposition of platinum-rhodium alloy diffusion barriers.