HYDROGEN PEROXIDE SOLUTIONS USE

Brand Owner Address Description
HIRINPER WAKO PURE CHEMICAL INDUSTRIES, LTD. 1-2, Doshomachi 3-chome Chuo-ku, Osaka-shi, Osaka 540-8605 Japan hydrogen peroxide solutions for use as cleaning agents for silicon wafers;hydrogen peroxide solutions for use in the electronics industry;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method of treating the surfaces of medical instruments which are contaminated with prions includes contacting the surface with a composition containing a source of peroxide ions, such as hydrogen peroxide, at a molar concentration of at least 1.5M peroxide (equivalent to approximately 5% hydrogen peroxide) and preferably, about 2M peroxide (approximately 7% hydrogen peroxide). The composition is optionally in the form of a gel. The composition is retained in contact with the surfaces for about 1-2 hours until all or substantially all prion contamination is removed.