LIGHT SENSITIVE PHOTORESIST COMPOSITION USE

Brand Owner (click to sort) Address Description
TDUR Tokyo Ohka Kogyo Kabushiki Kaisha 150 Nakamaruko Nakahara-ku, Kawasaki-shi Kanagawa-ken 211 Japan light-sensitive photoresist composition for use in the manufacture of electronic components;
THMR Tokyo Ohka Kogyo Kabushiki Kaisha 150 Nakamaruko Nakahara-ku, Kawasaki-shi Kanagawa-ken 211 Japan light-sensitive photoresist composition for use in the manufacture of electronic components;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A resist exposure system and a method of forming a pattern on a resist are provided and include an exposure source, a photoresist composition, and a mask positioned therebetween. The resist composition comprises a first photoresist X and a second photoresist Y. The first photoresist X absorbs at a higher wavelength than the second photoresist Y. The second photoresist Y has a lower glass transitional temperature than the first photoresist X.