LIGHT SENSITIVE PHOTORESIST COMPOSITIONS USE

Brand Owner (click to sort) Address Description
ARCH ARCH CHEMICALS, INC. 90 Boroline Road Allendale NJ 07401 light-sensitive photoresist compositions for use in the manufacture of electronic components;
PHOTOVIA ROHM AND HAAS COMPANY 400 Arcola Road Collegeville PA 19426 light-sensitive photoresist compositions for use in the manufacture of electronic components;
PHOTOVIA Shipley Company 455 Forest Street Marlborough MA 01752 light-sensitive photoresist compositions for use in the manufacture of electronic components;
SJR ROHM AND HAAS COMPANY 400 Arcola Road Collegeville PA 19426 light-sensitive photoresist compositions for use in the manufacture of electronic components, namely integrated and printed circuits;
SJR ROHM AND HAAS COMPANY 400 Arcola Road Collegeville PA 19426 light-sensitive photoresist compositions for use in the manufacture of electronic components, namely, integrated and printed circuits;
TEUV Tokyo Ohka Kogyo Co. Ltd. 150 Nakamaruko, Nakahara-ku Kawasaki-shi Kanagawa Japan light-sensitive photoresist compositions for use in the manufacture of electronic devices;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. The present invention relates to photoresist compositions for EUV and methods for forming photoresist patterns. More specifically, fine photoresist patterns: of less than 50 nm without collapse are formed with EUV (Extreme Ultraviolet) as an exposure light source by using a negative photoresist composition comprising a melamine derivative and polyvinylphenol.