LIQUID PRIMARY IMAGING PHOTORESIST SOLUTION

Brand Owner Address Description
AQUA MER MACDERMID ACUMEN, INC. 245 Freight Street Waterbury CT 06509 liquid primary imaging photoresist solution for industrial use;The lining is a feature of the mark and does not indicate color.;The English translation of MER is sea.;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Cleaning solutions for photoresist are disclosed which are useful for cleaning a semiconductor substrate in the last step of development when photoresist patterns are formed. Also, methods for forming photoresist patterns using the same are disclosed. The disclosed cleaning solution comprises H2O as a solution, a surfactant which is phosphate-alcoholamine salt represented by Formula 1, and an alcohol compound. The disclosed cleaning solution has lower surface tension than that of distilled water which has been used for conventional cleaning solutions, thereby improving resistance to photoresist pattern collapse and stabilizing the photoresist pattern formation.