LOW LOSS DIELECTRIC INSULATOR MATERIALS

Brand Owner (click to sort) Address Description
C-STOCK PRC-DESOTO INTERNATIONAL, INC. 12780 San Fernando Road Sylmar CA 91342 Low loss dielectric insulator materials for use in RF and microwave applications;CUMING-STOCK;
C-STOCK Cuming Microwave Corporation 264 Bodwell Street Avon MA 02322 Low loss dielectric insulator materials for use in RF and microwave applications;CUMING-STOCK;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. To fabricate an integrated semiconductor product with integrated metal-insulator-metal capacitor, first of all a dielectric auxiliary layer (6) is deposited on a first electrode (2, 3, 5). This auxiliary layer (6) is then opened up (15) via the first electrode. Then, a dielectric layer (7) is produced, and the metal track stack (8, 9, 10) for the second electrode is then applied to the dielectric layer (6). This is followed by the patterning of the metal-insulator-metal capacitor using known etching processes. This makes it possible to produce dielectric capacitor layers of any desired thickness using materials which can be selected as desired. In particular, this has the advantage that via etches can be carried out significantly more easily than in the prior art, since it is not necessary to etch through the residual dielectric capacitor layer above the metal tracks.