MACHINES USED STRIP PHOTO RESIST

Brand Owner Address Description
GREEN SULFACEED KD KURITA WATER INDUSTRIES LTD. 10-1, Nakano 4-chome, Nakano-ku Tokyo 164-0001 Japan Machines used to strip photo-resist and/or other organic residues off substrates in the semiconductor industry and other electronics industries; machines used to produce peroxide-sulfuric acid for stripping photo-resist and/or other residues off substrates in the semiconductor and other electronics industries; all of the foregoing having minimized environmental impact through reduced consumption of processing liquids;GREEN;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A photo-resist mask of organic compound is stripped off after the pattern transfer to a layer thereunder, wherein the photo-resist mask is firstly exposed to vapor of organic solvent for reducing the thickness through a reflow, and, thereafter, the photo-resist mask is ashed in an oxygen plasma, whereby the dry ashing is completed within a short time period by virtue of the reduction of thickness.