MATERIALS USE CHEMICAL

Brand Owner Address Description
SYMYX Symyx Technologies 3100 Central Expressway Santa Clara CA 95051 Materials for use in chemical and scientific research primarily in the fields of chemical and electronic applications, namely, permanent magnets; formulations derived by the mixing of various chemical compounds; and electronic materials, namely, thin-films, thick-films, panel displays, and phosphors; laboratory research tools used in the field of chemical and materials research and development primarily for chemical and electronic applications, namely, combinatorial and high throughput methods of materials research and development, namely, scanning mass spectrometers; photothermal deflection apparatus; vapor deposition apparatus; rapid fire light scattering apparatus; high throughput characterization apparatus, namely, polymer characterization apparatus; calorimetry apparatus, rehology apparatus, mechanical property testing apparatus, screening apparatus for catalysts and polymers; and software for controlling the operation and function of the aforementioned research equipment;Materials for use in chemical and scientific research, namely, heterogeneous and homogeneous catalysts, and formulations derived by the mixing of various compounds;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Method and structure for optimizing dual damascene patterning with polymeric dielectric materials are disclosed. Certain embodiments of the invention comprise polymeric sacrificial light absorbing materials ("polymer SLAM") functionalized to have a controllable solubility switch wherein such polymeric materials have substantially the same etch rate as conventionally utilized polymeric dielectric materials, and subsequent to chemical modification of solubility-modifying protecting groups comprising the SLAM materials by thermal treatment or in-situ generation of an acid, such SLAM materials become soluble in weak bases, such as those conventionally utilized to remove materials in lithography treatments.