METAL SPUTTERING TARGETS

Brand Owner (click to sort) Address Description
1 Johnson Matthey Electronics, Inc. East 15128 Euclid Avenue Spokane WA 99216 METAL SPUTTERING TARGETS;
A2 ADVANCED ALLOY KABUSHIKI KAISHA KOBELCO KAKEN 1-5-1 Wakihama Kaigandori, Chuo-ku Kobe 651-0073 Japan Metal sputtering targets; advanced alloys of common metal for use in the manufacture of metal sputtering targets; advanced alloys of common metal, namely, aluminum, silver, neodymium, nickel, tantalum, titanium, and bismuth;A TWO ADVANCED ALLOY;Color is not claimed as a feature of the mark.;ADVANCED ALLOY;
A2 ADVANCED ALLOY KABUSHIKI KAISHA KOBELCO KAKEN 1-5-1 Wakihama Kaigandori, Chuo-ku Kobe 651-0073 Japan Metal sputtering targets; advanced alloys of common metal for use in the manufacture of metal sputtering targets; advanced alloys of common metal, namely, aluminum, silver, neodymium, nickel, tantalum, titanium, and bismuth;A TWO ADVANCED ALLOY;Color is not claimed as a feature of the mark.;ADVANCED ALLOY;
A2 ADVANCED ALLOY KABUSHIKI KAISHA KOBELCO KAKEN 1-5-1 Wakihama Kaigandori, Chuo-ku Kobe 651-0073 Japan Metal sputtering targets; advanced alloys of common metal for use in the manufacture of metal sputtering targets; advanced alloys of common metal, namely aluminum, silver, neodymium, nickel, tantalum, titanium, and bismuth;A TWO ADVANCED ALLOY;Color is not claimed as a feature of the mark.;ADVANCED ALLOY;
A2 SQUARE KABUSHIKI KAISHA KOBELCO KAKEN 1-5-1 Wakihama Kaigandori, Chuo-ku Kobe 651-0073 Japan Metal sputtering targets;A TWO SQUARE;Color is not claimed as a feature of the mark.;
ALPHA 1 Johnson Matthey Electronics, Inc. East 15128 Euclid Avenue Spokane WA 99216 metal sputtering targets;
APX Johnson Matthey Electronics, Inc. East 15128 Euclid Avenue Spokane WA 99216 METAL SPUTTERING TARGETS;
C CONICAL Johnson Matthey Electronics, Inc. East 15128 Euclid Avenue Spokane WA 99216 metal sputtering targets;CONICAL;The drawing is lined for the colors blue and gray.;
ECAE Honeywell International Inc. 855 S. Mint Street Charlotte NC 28202 METAL SPUTTERING TARGETS;
EVAPRO MATERION CORPORATION 6070 Parkland Boulevard Mayfield Heights OH 44124 Metal sputtering targets; metal alloy for use in the manufacture of sputtering targets; metal for use in metal evaporation and coating processes; metal evaporation pellets used in physical vapor deposition processes;EVA PRO; EVAPORATION PRO; EVAPORATION PROCESS;
MAXPHASE Impact Coatings AB (publ) Westmansgatan 29 Linköping 58216 Sweden Metal sputtering targets; Metals and metal alloys for use as raw materials in vapor deposition machines; Metals and metal alloys for use as raw materials in vacuum plating machines; Metals and metal alloys for use in the manufacturing of metal sputtering targets;MAXPHASE; MAP BASE;Precious metal alloys for use as raw materials in vapor deposition machines; Precious metal alloys for use as raw materials in vacuum plating machines; Precious metal alloys for use in the manufacturing of metal sputtering targets;
OMEGA <ONE - 10> JOHNSON MATTHEY INC. 460 East Swedesford Road Wayne PA 19087 metal sputtering targets; namely, aluminum sputtering targets, used to produce a film or coating on a substrate by magnetron sputtering;ONE-10;
OUR NAME IS OUR PROMISE Reliable Silver Corporation 302 Platts Mill Road Naugatuck CT 06770 Metal sputtering targets;
PIONEER MATERIALS Pioneer Materials, Inc. 3357 Candlewood Road Torrance CA 90505 Metal sputtering targets;MATERIALS;
UNIPHASE Johnson Matthey Electronics, Inc. East 15128 Euclid Avenue Spokane WA 99216 METAL SPUTTERING TARGETS;UNI PHASE;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Disclosed is a process for producing a rubber-based composite material, including the steps of forming, by sputtering, an adhesion film on a substrate to be mated with a rubber for constituting the composite material, laminating a rubber composition on the adhesion film, and vulcanizing the rubber composition, the sputtering is conducted by using a first target and a second target, composed of different metallic components and provided in a chamber, while moving the substrate in sputtering atmospheres formed by applying electric power simultaneously to the first and second targets. Also disclosed is a process for producing a rubber-based composite material, including the steps of forming, by sputtering, an adhesion film on a substrate to be mated with a rubber for constituting the composite material, laminating a rubber composition on the adhesion film, and vulcanizing the rubber composition, wherein the sputtering is conducted by using a plurality of targets, composed of metals or metallic compounds containing different metallic elements and provided in a chamber, while rotating the substrate in sputtering atmospheres formed by applying electric power simultaneously to the targets.