MICROLITHOGRAPHY EQUIPMENT

Brand Owner (click to sort) Address Description
BASELINER ASML NETHERLANDS B.V. De Run 6501 DR Veldhoven NL-5504 Netherlands Microlithography equipment, namely, electronic products for measuring silicon wafers; apparatus and instruments for use in industry in the field of micro-lithography, namely, optical apparatus for inspection and testing for semiconductor wafers and photomasks; software for use in industry in the field of electronics, micro-lithography, semi-conductors, integrated circuits, magnetic domain memory and integrated optical systems industries, namely, for operation of microlithography machines, for designing semiconductors, integrated circuits and magnetic domain memories and for calculating manufacturing parameters; software for the design, testing and fabrication of photo-lithographic masks; semiconductors; integrated circuits; photo-lithographic masks; magnetic heads, namely, electric and magnetic contacts for integrated circuit testers; semiconductor chips;Machines for micro-lithography, namely, machines for manufacturing semiconductors; machines for use in industry in the field of electronics, integrated circuits, semi-conductors, magnetic domain memory and integrated optical systems industries, namely, machines for manufacturing integrated circuits, semi-conductors, magnetic domain memories and optical devices; parts of the aforesaid goods, namely, etching lasers for semiconductor manufacturing machines;BASE LINER;[ Technical consultancy in relation to the engineering of machines, apparatus and instruments for use in industry in the field of electronics, micro-lithography, semi-conductors, integrated circuits, magnetic domain memories and integrated optical systems industries; design, maintenance and development of computer software for use in industry in the field of electronics, micro-lithography, semi-conductors, integrated circuits, magnetic domain memories and integrated optical systems industries and for the design, testing and manufacture of photo-lithographic masks ];
TWINSCAN NXE ASML NETHERLANDS B.V. De Run 6501 DR Veldhoven NL-5504 Netherlands Microlithography equipment, namely, silicon wafers; apparatus and instruments, namely, semiconductor devices for use in the field of micro-lithography, semi-conductors, integrated circuits, magnetic domain memory and integrated optical systems; parts of the aforesaid goods, namely, silicon wafers for semiconductors; computer operating software for use in the field of micro-lithography, semi-conductors, integrated circuits, magnetic domain memory and integrated optical systems; software for the design, testing and fabrication of photo-lithographic masks; semiconductors; integrated circuits; photo-lithographic protection masks; magnetic heads, namely, electric and magnetic contacts for integrated circuit testers; computer chips, namely, semiconductor chips; LCD display monitors, computer memories, namely, magnetic domain memories, integrated optical systems, comprised of optical cables, optical semiconductor amplifiers and optical sensors for data transmission;Machines for micro-lithography, namely, machines for manufacturing semiconductors; semiconductor manufacturing machines for use in the field of electronics, integrated circuits, semi-conductors, magnetic domain memory and integrated optical systems; machine parts of the aforesaid goods, namely, etching lasers for semiconductor manufacturing machines;TWIN SCAN NXE;[ Technical consultancy in the field of engineering, namely, in the field of machines, apparatus and instruments for use in the field of micro-lithography, semi-conductors, integrated circuits, magnetic domain memories and integrated optical systems; design, maintenance and development of computer software for use in the field of micro-lithography, semi-conductors, integrated circuits, magnetic domain memories and integrated optical systems and for the design, testing and manufacture of photo-lithographic masks; advice and consultancy in relation to the aforesaid services ];
 

Where the owner name is not linked, that owner no longer owns the brand

   
Technical Examples
  1. A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.