MICROPOROUS FILTERS POLYMERIC MATERIALS

Brand	Owner	Address	Description
ACCUREL	EVONIK OPERATIONS GMBH	Rellinghauser Strasse 1-11 Essen 45128 Germany	Microporous Filters of Polymeric Materials;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

Method and structure for optimizing dual damascene patterning with polymeric dielectric materials are disclosed. Certain embodiments of the invention comprise polymeric sacrificial light absorbing materials ("polymer SLAM") functionalized to have a controllable solubility switch wherein such polymeric materials have substantially the same etch rate as conventionally utilized polymeric dielectric materials, and subsequent to chemical modification of solubility-modifying protecting groups comprising the SLAM materials by thermal treatment or in-situ generation of an acid, such SLAM materials become soluble in weak bases, such as those conventionally utilized to remove materials in lithography treatments.