OPTICAL METROLOGY INSPECTION SYSTEM COMPRISED

Brand Owner (click to sort) Address Description
ACCC INFOCORE CTC GLOBAL CORPORATION 2026 McGaw Avenue Irvine CA 92614 Optical metrology inspection system comprised of a light source and a camera, recorded computer software for operating the metrology inspection system and computer hardware;
EZ SLAM EZ Metrology, Inc. 5039 Durnham Drive Waterford MI 48327 OPTICAL METROLOGY INSPECTION SYSTEM COMPRISED OF A LIGHT SOURCE, ONE OR MORE CAMERAS AND SENSORS IN COMMUNICATION WITH COMPUTER SOFTWARE AND HARDWARE; SCIENTIFIC APPARATUS, NAMELY, SENSING AND SIGNALING DEVICES FOR MEASUREMENT AND QUALITY CONTROL OF MATERIALS PROCESSED BY LASER;EASY SLAM;
I-RAMAN METROHM SPECTRO, INC. 313 ENTERPRISE DRIVE PLAINSBORO NJ 08536 optical metrology inspection system comprised of a light source, one or more cameras and sensors in communication with computer software and hardware;
I-SPEC METROHM SPECTRO, INC. 313 ENTERPRISE DRIVE PLAINSBORO NJ 08536 optical metrology inspection system comprised of a light source, one or more cameras and sensors in communication with computer software and hardware;
I-SPEC B & W TEK, INC. 19 Shea Way, Suite 301 Newark DE 19713 optical metrology inspection system comprised of a light source, one or more cameras and sensors in communication with computer software and hardware;
INFOCORE CTC GLOBAL CORPORATION 2026 McGaw Avenue Irvine CA 92614 Optical metrology inspection system comprised of a light source and a camera, recorded computer software for operating the metrology inspection system and computer hardware;INFORMATION CORE;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.