PHOTOLITHOGRAPHY APPARATUS USED IN

Brand Owner (click to sort) Address Description
ALS LASERSTEP GENERAL SIGNAL TECHNOLOGY CORPORATION 700 TERRACE POINT DRIVE MUSKEGON MI 49443 PHOTOLITHOGRAPHY APPARATUS USED IN THE MANUFACTURE OF MICRO-ELECTRONIC CIRCUITS;ALS LASER STEP;LASERSTEP;
ALS WAFERSTEP INTEGRATED SOLUTIONS, INC. P.O. Box 145024 Coral Gables FL 33114 PHOTOLITHOGRAPHY APPARATUS USED IN THE MANUFACTURE OF MICRO-ELECTRONIC CIRCUITS;ALS WAFER STEP;WAFERSTEP;
 

Where the owner name is not linked, that owner no longer owns the brand

   
Technical Examples
  1. A pattern control system for cooling a wafer prior to a photolithography exposure step. The pattern control system includes a wafer transfer pathway for transferring the wafer in a photolithography process and at least one cooling module provided along the wafer transfer pathway for cooling the wafer. Cooling of the wafers prevents thermal distortion of circuit pattern images formed in a photoresist layer on the wafer during a subsequent photolithography exposure process.