POLISHING SLURRIES USED

Brand Owner Address Description
MAGNA Cabot Microelectronics Corporation 870 North Commons Drive Aurora IL 60504 polishing slurries used in the processing of magnetic recording heads;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Aqueous polishing slurries for chemical-mechanical polishing are effective for polishing copper at high polish rates. The aqueous slurries according to the present invention may include soluble salts of molybdenum dissolved in an oxidizing agent and molybdic acid dissolved in an oxidizing agent. Methods for polishing copper by chemical-mechanical planarization include polishing copper with low pressures using a polishing pad and a aqueous slurries including soluble salts of molybdenum dissolved in an oxidizing agent and molybdic acid dissolved in an oxidizing agent, particles of MoO3 dissolved in an oxidizing agent, and particles of MoO2 dissolved in an oxidizing agent.