POLISHING PADS POLISHING MACHINES

Brand Owner (click to sort) Address Description
ENCORE Cabot Microelectronics Corporation 870 North Commons Drive Aurora IL 60504 Polishing pads for polishing machines, primarily for use in the semiconductor and electronic industries;
EPIC CMC MATERIALS, INC. 870 N. Commons Drive Aurora IL 60504 Polishing Pads for Polishing Machines, Primarily for Use in the Semiconductor and Electronic Industries;
EPIC POWER CMC MATERIALS, INC. 870 N. Commons Drive Aurora IL 60504 Polishing pads for polishing machines for use in the manufacture of integrated circuit wafers, semiconductor wafers, integrated circuits, hard disk drives and chipsets; Non-abrasive polishing pads for chemical-mechanical planarizing or chemical mechanical polishing (cmp) machines for use in the manufacture of integrated circuit wafers, semiconductor wafers, integrated circuits, hard disk drives and chipsets;
GO CABOT MICROELECRONICS CORPORATION 870 N. COMMONS DRIVE AURORA IL 60504 Polishing pads for polishing machines, primarily for use in the semiconductor and electronic industries;
J.H. RHODES JH RHODES COMPANY, INC. Suite 675 2800 North 44th Street Phoenix AZ 85008 polishing pads for polishing machines for polishing substrates;The name J.H. RHODES does not identify a living individual.;
MEDEA CMC MATERIALS, INC. 870 N. Commons Drive Aurora IL 60504 Polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets;
NEOPAD Neopad Technologies Corporation 1290 Oakmead Parkway, Suite 305 Sunnyvale CA 940854045 Polishing pads for polishing machines for use in the manufacture of semiconductor wafers;
NEXPLANAR CMC MATERIALS, INC. 870 N. Commons Drive Aurora IL 60504 polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets;NEXT PLANNER;
NEXPLANAR NEXPLANAR CORPORATION 7175 NW Evergreen Parkway, Suite 200 HILLSBORO OR 97124 polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets;NEXT PLANNER;
NEXPLANAR Neopad Technologies Corporation 1290 Oakmead Parkway, Suite 305 Sunnyvale CA 940854045 polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets;NEXT PLANNER;
WSP JSR CORPORATION 9-2, Higashi-Shinbashi 1-chome Minato-ku, Tokyo 105-8640 Japan Polishing pads for polishing machines for use in the manufacture of semiconductor wafers;
 

Where the owner name is not linked, that owner no longer owns the brand

   
Technical Examples
  1. Double-sided polishing equipment configured to polish a rectangular substrate, comprising a carrier having a pocket configured to accommodate a rectangular substrate, a lateral linear moving mechanism configured to move the carrier, first and second polishing pads with first and second rotational axes, respectively, offset from centers of the pads, the polishing surfaces of the first and second polishing pads being parallel. The equipment further includes at least one elevating mechanism coupled to at least one of the polishing pads, first and second rotary drive mechanisms coupled to each of the first and second polishing pads, respectively; and configured to rotate the first and second pads about the first and second rotational axes. A polishing-agent supplying device is present and configured to supply polishing agent to a plane where a substrate that is accommodated in the pocket to accommodate the substrate comes into contact with the polishing pads.