POLISHING WAX

Brand Owner (click to sort) Address Description
ALL KLEER Sol-Tech Group, Inc 7791 Yellowwood Drive Mason OH 45040 Polishing wax;
ASK YOURSELF, "DID YOU WAX THAT GUN?" Mill Creek Outdoors 500 NORTH LAKE RD COLUMBIAXRDS PA 16914 Polishing wax;
DRIFTWOOD Poe, Kimberly L. 426 Tulip Dr Sebastian FL 32958 polishing wax; liming wax; clear wax finishes for wood; colored wax finishes for wood;coatings, namely, stains and clear finishes for exterior and interior use; wood stains;
FINISHER'S FORMULA Ruelle, Eugene,H 506 W. Shaw ruelle.com Tyler TX 75701 Polishing wax; Furniture polish;
FIRE GLAZE Restructure Marine Products 19402 Pricetown Avenue Carson CA 90746 Polishing wax, polishing preparations;
FLASH MALCO PRODUCTS, INC. 361 Fairview Avenue Barberton OH 44203 Polishing wax;
FRED WAX Ron Roth PO Box 262 Monrovia CA 91016 Polishing wax, namely, liquid spray-on carnauba wax for bicycle maintenance;WAX;
RALG Restructure Marine Products 19402 Pricetown Ave Carson CA 90746 Polishing wax, polishing preparations;
RAY'S GUN WAX Mill Creek Outdoors 500 NORTH LAKE RD COLUMBIAXRDS PA 16914 Polishing wax;GUN WAX;
TEMPO THE MOORE COMPANY PO Box 538 Westerly RI 02891 POLISHING WAX;
TIMELESS FARMHOUSE Real Milk Paint Co. 126 Commerce Drive Hohenwald TN 38462 Polishing wax;Acrylic paints; Water-based paints;
TRU-POLISH MALCO PRODUCTS, INC. 361 Fairview Avenue Barberton OH 44203 Polishing wax;TRUE-POLISH;
VESTA-GLOSS MERCK & CO., INC. Rahway NJ POLISHING WAX;
WEATHERING WAX Poe, Kimberly L 426 Tulip Drive Sebastian FL 32958 Polishing wax; colored wax finishes for wood;WAX;
Z'S WOOD NECTAR ZBD Goods 6232 White Pine Dr McKinney TX 75070 Polishing wax;WOOD;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method for chemical mechanical polishing (CMP) wafers having high aspect ratio surface topography. A wafer is positioned on a plate. A polishing pad is coupled to a platen. A polishing solution (e.g., slurry) is added between the polishing pad and the wafer. CMP is performed on the wafer by creating a relative movement between the polishing pad and the wafer. The polishing pad removes substantially all residual material from the channels. To accomplish this, the polishing pad has a compressibility of at least 5% at a polishing pressure of about 4 psi.