POLYMERIC LACQUERS

Brand	Owner	Address	Description
ENSOCOTE	UNITED STATES RUBBER COMPANY	NEW YORK NY	POLYMERIC LACQUERS, AND POLYMERIC MATERIALS ADAPTED TO BE FORMULATED WITH OTHER INGREDIENTS TO FORM LACQUERS;ENSOCOAT;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

The polishing pad is suitable for planarizing at least one of semiconductor, optical and magnetic substrates. The polishing pad includes a polymeric matrix having a top polishing surface; and the top polishing surface has polymeric polishing asperities or forms polymeric polishing asperities upon conditioning with an abrasive. The polymeric polishing asperities extend from the polymeric matrix and represent the portion of the top polishing surface that can contact a substrate during polishing. The polymeric polishing asperities are from a polymeric material having a bulk ultimate tensile strength of at least 6,500 psi (44.8 MPa) and a bulk tear strength of at least 250 lb/in. (4.5Ã—10