PREPARATIONS FOR CLEANING POLISHING

Brand Owner (click to sort) Address Description
CLEANOLA CLEANOLA COMPANY, THE 1116 WILLIAM FLINN HIGHWAY GLENSHAW, PA. PREPARATIONS FOR CLEANING AND POLISHING WOOD, GLASS, METAL, AND OTHER SURFACES;
GODDARD'S GLOW J. GODDARD & SONS LIMITED CAMBERLEY, SURREY ENGLAND Preparations for Cleaning and Polishing Metal Surfaces;GODDARDS GLOW;
NEW LOOK Union Carbide Corporation 7501 State Highway 185 North Seadrift TX 77983 Preparations for Cleaning and Polishing Automotive Bodies and Other Surfaces;
PICO BELLO HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN(HENKEL KGAA) Henkelstrasse 67 D-40191 Duesseldorf Germany PREPARATIONS FOR CLEANING AND POLISHING AND FOR THE CARE OF SHOES AND LEATHER;THE WORDS PICO BELLO IS A COLLOQUIAL EXPRESSION THAT CONNOTES EXQUISITE BEAUTY OR PEAK OF BEAUTY.;
PRESTONE PRESTONE PRODUCTS CORPORATION 69 Eagle Road Danbury CT 06810 PREPARATIONS FOR CLEANING AND POLISHING AUTOMOBILE BODIES AND OTHER SURFACES;
PRIDE S. C. Johnson & Son, Inc. 1525 Howe Street Racine WI 53403 PREPARATIONS FOR CLEANING AND POLISHING OVENS, FURNITURE AND OTHER HARD, INANIMATE SURFACES;
WINDOLENE RECKITTS (NEW YORK) LTD. NO. 1 MUSTARD STREET ROCHESTER NY PREPARATIONS FOR CLEANING AND POLISHING GLASS;WINDOWLENE;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A polishing pad is cleaned of Cu CMP by-products, subsequent to planarizing a wafer, to reduce pad-glazing by applying to the polishing pad surface a composition comprising about 0.1 to about 3.0 wt. % of at least one organic compound having one or more amine or amide groups, an acid or a base in an amount sufficient to adjust the pH of the composition to about 5.0 to about 12.0, the remainder water. Embodiments comprise ex situ cleaning of a rotating polishing pad by applying a solution having a pH of about 5.0 to about 12.0 at a flow rate of about 100 to about 600 ml/min. for about 3 to about 20 seconds after polishing a wafer having a Cu-containing surface and then removing the cleaning solution from the polishing pad by high pressure rinsing with water.