PROVIDING METALLIZATION SURFACE FINISHING

Brand Owner (click to sort) Address Description
ABEXL Samtec, Inc. 520 PARK EAST BLVD. NEW ALBANY IN 47151 providing metallization and surface finishing services for micro-nano geometry parts, devices and structures; providing general and customizable metallization and surface finishing services for applications in the fields of semiconductor packaging, microelectrical mechanical systems (MEMS), and bio-devices;metallic material used to metallize micro-nano geometry parts, devices and structures, namely, semiconductor packaging, microelectrical mechanical systems (MEMS) and bio-devices;
ABEXL ABEXL Inc. 48511 Warm Springs Blvd, Ste. 207 Fremont CA 94539 providing metallization and surface finishing services for micro-nano geometry parts, devices and structures; providing general and customizable metallization and surface finishing services for applications in the fields of semiconductor packaging, microelectrical mechanical systems (MEMS), and bio-devices;metallic material used to metallize micro-nano geometry parts, devices and structures, namely, semiconductor packaging, microelectrical mechanical systems (MEMS) and bio-devices;
VIAFIL Samtec, Inc. 520 PARK EAST BLVD. NEW ALBANY IN 47151 providing metallization and surface finishing services for micro-nano geometry parts, devices and structures; providing general and customizable metallization and surface finishing services for applications in the fields of semiconductor packaging, microelectrical mechanical systems (MEMS), and bio-devices;VIA FILL;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method of using finishing aids for advanced finishing control is described. A finishing surface is used generally to induce frictional wear. The finishing aids with preferred in situ control can improve control of the coefficient of friction, the tangential force of friction, a finishing rate, a regional finishing rate(s), a differential finishing rate, and help reduce unwanted defects. A finishing aid can reduce friction. A lubricant is an illustrative finishing aid. The method uses finishing control subsystem having a multiplicity of operative process sensors along with tracked information to improve in situ control of finishing. Differential finishing rate methods are described to differentially finish semiconductor wafers. Differential lubricating film methods are described to differentially finish semiconductor wafers. Planarization and localized finishing can be improved using differential lubricating boundary layer methods of finishing with improved real time control.