RAW MATERIALS USE

Brand Owner (click to sort) Address Description
ALTAHANCE INGEVITY SOUTH CAROLINA Suite 400 4920 O'Hear Avenue North Charleston SC 29405 Raw materials for use in the manufacture of agricultural products, namely, distilled tall oil, rosins, tall oil fatty acids, and the derivatives of these products;
ALTAPYNE INGEVITY SOUTH CAROLINA Suite 400 4920 O'Hear Avenue North Charleston SC 29405 Raw materials for use in the manufacture of industrial products, namely, distilled tall oil, rosins, tall oil fatty acids, and the derivatives of these products;The wording ALTAPYNE has no meaning in a foreign language.;
LIPCUAT Biocosmetica Exel Argentina S.R.L. Calle Humberto Illia 1983 San Justo, Buenos Aire B1754 Argentina raw materials for use in cosmetic and pharmaceutical products, namely, carriers for active ingredients in the form of powders, liposomes, and cationic nanoparticles;
NANOVEC Biocosmetica Exel Argentina S.R.L. Calle Humberto Illia 1983 San Justo, Buenos Aire B1754 Argentina raw materials for use in cosmetic and pharmaceutical products, namely, carriers for active ingredients in the form of powders, liposomes, and cationic nanoparticles;
VITAPRESS - A CELLMARK USA 2 Corporate Drive Shelton CT 06484 Raw materials for use in processed products, namely, anhydrous dicalcium phosphate, unmilled;
VITAPRESS - A Anmar International Ltd 540 Barnum Avenue Bridgeport CT 066080343 Raw materials for use in processed products, namely, anhydrous dicalcium phosphate, unmilled;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Method and structure for optimizing dual damascene patterning with polymeric dielectric materials are disclosed. Certain embodiments of the invention comprise polymeric sacrificial light absorbing materials ("polymer SLAM") functionalized to have a controllable solubility switch wherein such polymeric materials have substantially the same etch rate as conventionally utilized polymeric dielectric materials, and subsequent to chemical modification of solubility-modifying protecting groups comprising the SLAM materials by thermal treatment or in-situ generation of an acid, such SLAM materials become soluble in weak bases, such as those conventionally utilized to remove materials in lithography treatments.