SEMICONDUCTOR FABRICATION SERVICES

Brand Owner (click to sort) Address Description
E-PHOCUS TREX ENTERPRISES CORPORATION 10455 Pacific Center Court San Diego CA 92121 semiconductor fabrication services, namely, fabrication of image sensors for image capture in visible, infrared, ultraviolet and X-ray spectra;E-FOCUS; E FOCUS;
HI-DEF TREX ENTERPRISES CORPORATION 10455 Pacific Center Court San Diego CA 92121 semiconductor fabrication services, namely, fabrication of image sensors for image capture in visible, infrared, ultraviolet and X-ray spectra;HI DEF;
HI-QE TREX ENTERPRISES CORPORATION 10455 Pacific Center Court San Diego CA 92121 semiconductor fabrication services, namely, fabrication of image sensors for image capture in visible, infrared, ultraviolet and X-ray spectra;HI QE;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method for determining photoresist thickness is disclosed that can be used in a semiconductor fabrication process. A layer of material is formed that has one or more common characteristic relative to the material in the layer that is to be patterned in the semiconductor fabrication process. A layer of photoresist is then formed that has varying thickness. The thickness of the layer of photoresist is determined at a plurality of different points. The layer of photoresist is exposed, developed and etched. The remaining structures are then analyzed to determine photoresist thickness to be used in the semiconductor fabrication process. The determined photoresist thickness is then used in the semiconductor fabrication process to form structures on a semiconductor wafer.