SEMICONDUCTOR PROCESSING EQUIPMENT NAMELY SUBSTRATE

Brand Owner Address Description
RITE TRACK RITE TRACK EQUIPMENT SERVICES 8655 RITE TRACK WAY WEST CHESTER OH 45069 Semiconductor processing equipment namely substrate baking, coating, cleaning, developing and drying machines;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. The invention relates to a method for calibrating thermal processing equipment used for heat treatment of a multilayer substrate, in particular a multilayer semiconductor substrate. A calibration test profile is determined by processing a calibration test substrate according to thermal process parameters that produce multilayer substrates having an even thickness profile, and/or having reduced slip lines and/or reduced wafer deformation, and/or having other desired and predetermined properties. Then a particular thermal processing equipment is calibrated by determining thermal process parameters for that equipment so that a test substrate processed with these parameters will have the determined calibration test profile.