SEMICONDUCTOR WAFER LITHOGRAPHY CHARACTERIZATION SYSTEM

Brand	Owner	Address	Description
LITHOMAP	KLA-TENCOR TECHNOLOGIES CORPORATION	One Technology Drive Milpitas CA 95035	Semiconductor Wafer Lithography Characterization System Comprised of Some or All of the Following: Programmable Computer, Graphics Terminal, Graphic Printer, and Programmable x-y Prober with Optics and Probe Card;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

The hydrodynamic effects-which occur during immersion lithography as a result of the movement of the semiconductor wafer-in a liquid preferably provided between the last lens surface of the projection system and the semiconductor wafer can be avoided by means of a movable illumination region for illuminating a cutout of a mask containing a structure to that can be imaged onto the semiconductor wafer. A scan movement of the mask and the semiconductor wafer can be either reduced or entirely avoided by means of a movement of the illumination region.