SPIN CLEAN

Brand Owner (click to sort) Address Description
SPIN-KLEEN CHASKA CHEMICAL COMPANY, INC. 12502 XENWOOD AVENUE SOUTH SAVAGE MN 55378 SPIN-CLEAN;SURFACE CLEANING EQUIPMENT-NAMELY, FLOOR CLEANING MACHINES, FLOOR CLEANERS, FLOOR SCRUBBERS, AND FLOOR AND CONVEYOR SCRUBBERS;
SPINCLEAN QIAGEN SCIENCES 19300 Germantown Road Germantown MD 20874 SPIN CLEAN;DNA purification kits composed primarily of reagents used in molecular biology research;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method of fabricating a CMR thin film for use in a semiconductor device includes preparing a CMR precursor in the form of a metal acetate based acetic acid solution; preparing a wafer; placing a wafer in a spin-coating chamber; spin-coating and heating the wafer according to the following: injecting the CMR precursor into a spin-coating chamber and onto the surface of the wafer in the spin-coating chamber; accelerating the wafer to a spin speed of between about 1500 RPM to 3000 RPM for about 30 seconds; baking the wafer at a temperature of about 180° C. for about one minute; ramping the temperature to about 230° C.; baking the wafer for about one minute at the ramped temperature; annealing the wafer at about 500° C. for about five minutes; repeating said spin-coating and heating steps at least three times; post-annealing the wafer at between about 500° C. to 600° C. for between about one to six hours in dry, clean air; and completing the semiconductor device.