UNEXPOSED PHOTOGRAPHIC FILMS

Brand Owner (click to sort) Address Description
AGFA EASY AGFA-GEVAERT AKTIENGESELLSCHAFT K-RP Markenschutz Postfach 10 01 60 D-51301, Leverkusen Germany unexposed photographic films;
ALL-ROUND FUJI PHOTO FILM CO., LTD. No. 210, Nakanuma Minami Ashigara-shi Kanagawa Japan unexposed photographic films;
ASTIA FUJIFILM CORPORATION 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620 Japan unexposed photographic films;
CENTURIA DAI NIPPON INSATSU KABUSHIKI KAISHA 1-1 Ichigaya Kagacho 1-chome Shinjuku-ku, Tokyo 162-8001 Japan UNEXPOSED PHOTOGRAPHIC FILMS;
CONFETTI FUJIFILM CORPORATION 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620 Japan Unexposed photographic films; unexposed photographic papers;
EYE VISION Agfa-Gevaert AG Kaiser-Wilhelm-Allee D-51373 Leverkusen Germany unexposed photographic films;
INSTAX FUJI PHOTO FILM CO., LTD. No. 210, Nakanuma Minami Ashigara-shi Kanagawa Japan Unexposed photographic films;
NEGABYTE FUJI PHOTO FILM B.V. Oudenstaart 1 5047 TK TILBURG Netherlands UNEXPOSED PHOTOGRAPHIC FILMS;
NEW REALA TECHNOLOGY FUJI PHOTO FILM CO., LTD. No. 210, Nakanuma Minami Ashigara-shi Kanagawa Japan Unexposed photographic films;
NEXIA FUJI PHOTO FILM CO., LTD. No. 210, Nakanuma Minami Ashigara-shi Kanagawa Japan unexposed photographic films;
PERUCOLOR AGFA-GEVAERT AKTIENGESELLSCHAFT K-RP Markenschutz Postfach 10 01 60 D-51301, Leverkusen Germany Unexposed Photographic Films;
POLAROID GREY LABEL PLR IP HOLDINGS 4350 Baker Road Minnetonka MN 55343 Unexposed photographic films; unexposed photographic film cartridges; photographic paper; photosensitive paper;GREY LABEL;
PROVIA FUJIFILM CORPORATION 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620 Japan unexposed photographic films;
STAR-ILLUMINATION FUJIFILM CORPORATION 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620 Japan Unexposed photographic films; unexposed photographic papers;
VERIMASK AGFA AKTIENGESELLSCHAFT LEVERKUSEN-BAYERWERK Germany UNEXPOSED PHOTOGRAPHIC FILMS;
VISTA AgfaPhoto Holding GmbH Hohenzollernring 55 50672 Köln Germany Unexposed photographic films;
X-TRA FUJIFILM CORPORATION 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620 Japan Unexposed photographic films; unexposed photographic papers;
XRG AGFA-GEVAERT AKTIENGESELLSCHAFT K-RP Markenschutz Postfach 10 01 60 D-51301, Leverkusen Germany unexposed photographic films;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. In one aspect, the invention encompasses a semiconductor processing method. A layer of material is formed over a semiconductive wafer substrate. Some portions of the layer are exposed to energy while other portions are not exposed. The exposure to energy alters physical properties of the exposed portions relative to the unexposed portions. After the portions are exposed, the exposed and unexposed portions of the layer are subjected to common conditions. The common conditions are effective to remove the material and comprise a rate of removal that is influenced by the altered physical properties of the layer. The common conditions remove either the exposed or unexposed portions faster than the other of the exposed and unexposed portions. After the selective removal of the exposed or unexposed portions, and while the other of the exposed and unexposed portions remains over the substrate, the wafer is cut into separated die. In another aspect, the invention encompasses another semiconductor processing method. A layer of (CH3)ySi(OH)4?y is formed over a substrate. Some portions of the layer are exposed to ultraviolet light while other portions are not exposed. The exposure to ultraviolet light converts the exposed portions to (CH3)xSiO2?x. After the exposure to ultraviolet light, the exposed and unexposed portions of the layer are subjected to hydrofluoric acid to selectively remove the (CH3)ySi(OH)4?y of the unexposed portions relative to the (CH3)xSiO2?x of the exposed portions.