CARL ZEISS SMT GMBH

ARTEMIS

Microscopes and parts thereof;

CDC200

Tools for controlling the critical dimensions of photomasks, also commonly referred to as reticles, namely, a machine used to physically alter the photomask, said tool utilizing a laser to locally alter light transmission of said photomask, the foregoing for use in manufacturing photomasks and in lithographic applications;CD CONTROL 200;

CIRGEN

Focused ion beam apparatus comprised of computer hardware and recorded computer software to perform imaging and nano-fabrication analysis and prototyping of integrated circuits;

FAVOR

Server for linking instruments used in the semiconductor field and for analyzing and evaluating data obtained from such instruments;

FLEXILLU

Optical inspection apparatus, namely, semiconductor mask inspection apparatus and parts thereof;In the statement, Column 1, line 8, German application and registration numbers 30200014935 & 30200014935, expiration date 3-19-2019 should be deleted, and 302009014935 & 302009014935, expiration date 3-31-2019 should be inserted.;FLEX ILLU;

GALILEO

Very high sensitivity transmission measuring tool comprising a deep ultraviolet broadband light source and a deep ultraviolet photodetector for use in manufacturing photomasks that are used in the further manufacture of semiconductors, said tool utilizing non-imaging optics, an ultra-precision motion apparatus and ultra-clean room environment that allows safe handling of semiconductor manufacturing materials;

MAVRIX

software platform for the visualization and analysis of semiconductor image data;MAVERICKS;

NOBLEFIB

Ion microscopes and parts thereof;NOBLE FIB;

PGA

Scientific apparatus, namely, mass spectrometers;

PREDICT

Installation, maintenance and repair of semiconductor equipment for others; replacement of worn or defective electronic parts of semiconductor equipment for others;Installation, maintenance, repair and updating of computer software, used in semiconductor equipment, for others; leasing of computer software used in semiconductor equipment;

PROVE

measuring instruments to measure positions of structures on photomasks; computer software for use in operating measuring instruments to measure positions of structures on photomasks and evaluating data they provide;

REGC

laser equipment used to move registration/reference marks on photomasks for use in fabrication of integrated circuits;REGISTRATION CARL;

REPSCAN

Microscopes and parts thereof; x-ray microscopes and parts thereof; downloadable software used for automated acquisition and registration of x-ray images;REP SCAN;

STARLITH

lens objectives for use with wafersteppers and illuminators;IN THE STATEMENT, COLUMN 1, LINE 12, CARL-ZEIS-STIFTUNG SHOULD BE DELETED, AND, CARL-ZEISS-STIFTUNG SHOULD BE INSERTED.;

X VERSE

Recorded data; web applications and server software; utility, security and cryptographic software; apparatus for scientific research and laboratory work, teaching apparatus and simulators; information technology, audiovisual, multimedia and photographic equipment; Scientific and laboratory equipment for electrical physical reactions; virtual and augmented reality software; Artificial intelligence software and machine learning software; measuring, detection, monitoring and control equipment; navigation, orientation, location tracking, target tracking and mapping equipment; software to monitor, analyze, control and perform operations in the physical world; operating systems; software; office and business application software; Optical devices and equipment, amplifiers and correctors;Design services; IT services; Scientific and technological services;